
Why exhibit?
Around 200 participants are expected. The major part of the participating scientists are experimentalists and use advanced state-of-the-art techniques such as Atomic Force Microscopy (AFM), sputtering for surface analysis (SIMS, TOF-SIMS), ion scattering techniques, high and ultra-high vacuum equipment, ultra pure target materials, techniques for surface preparation and control (magnetron sputtering, AES, LEED, etc.), optical instrumentation (microscopes, Lasers), data acquisition and analysis soft- and hardware and many more.